Silicon Epitaxial Growth
Under low-temperature conditions,
SiH₃Cl is used to deposit **high-purity silicon epitaxial layers**. It performs exceptionally well in low-temperature epitaxy, helping to **reduce the thermal budget** and its impact on device performance.
Low-Temp Epitaxy
CVD
Semiconductor
Amorphous Silicon Deposition (a-Si)
Acts as a silicon source for CVD processes to deposit **amorphous silicon thin films**. It is primarily used in the manufacturing of **thin-film solar cells** and **thin-film transistors (TFT)**.
Solar Cells
TFT
a-Si
Polysilicon Deposition
Used to manufacture **high-purity polycrystalline silicon thin films**, a key material for the semiconductor and display panel industries. Applications include **TFT-LCD** and various **memory devices**.
TFT-LCD
Memory Devices
Polysilicon
Higher Silane Precursor
Serves as a chemical precursor for the synthesis of **higher silanes** (such as Disilane). Higher silanes are critical intermediates for preparing more complex silicon-based materials.
Disilane
Intermediate
Precursor
